As nanotechnology has an increasing importance in industrial and academic activities, the demand for accurate measurement of sub­micron features is growing. It is so for Atomic Force Microscopes (AFM) and Scanned Probes Microscopes (SPM) metrology tools which need to be calibrated with a standard to achieve higher accuracy.

SILIOS Technologies has developed and patented standards for calibrating vertical dimensions under the twenty nanometer level for both AFMs and SPMs. It proposes different step heights ranging from 1 to 20 nm. The calibration standards can be supplied separately or gathered in a single standard.

Step Height Ranges
Code:	Step Height Range3:
SIL0201 SIL0101 SIL0051 SIL0012	20nm 10nm 5nm 1nm
1Available 2Under development 3Nominal value may vary by +/-2nm
Tolerances:
Typical : +/-1nm Option 1: SILIOS certified (optical and mechanical measurements) Option 2: Certification from an accredited laboratory (ISO5436 based)
Specifications
Chip size: Effective area: Material: Grating pitch: Configuration:	5mm x 5mm x 0.5mm 1mm x 1mm SiO2 or Si 5µm classic or stairs
Applications
Atomic Force Microscope (AFM) Scanning Probe Microscope (SPM)
Fields
Scientific and industrial metrology
Whole Chip		Target Area
Grating Configuration
Classic